-NGR2100
-NGR4000
NGR2100

The NGR2100 is the industry's first Geometry Verification Tool, for wafer level analysis of systematic defects. Using NGR's patented die-to-database technology and electron beam pattern inspection system, the NGR2100 can verify the entire wafer at high speeds.

The revolutionary NGR2100 scans the wafer with an electron beam and compares the resulting pattern to the corresponding design layout data (GDS) in real time to verify defects beyond the 65 nm node, a task that is almost impossible with lithography simulation. The NGR2100 is a dream come true for semiconductor manufacturers as it can greatly to reduce cycle time.

¡íAlignment Screen ¡íRecipe Setting Screen ¡íInspection Result Screen
Characteristics:
  1. Newly developed Electron Image Acquiring System (EIAS) with wide field of view (FOV) and low distortion
  2. Can conduct high-speed root cause and other statistical analysis
  3. Proprietary algorithm capable of processing Die-to-Database design data with image data
  4. Can handle design data of several hundred gigabytes
  5. 2 dimensional CD pattern verification and systematic defect detection
  6. Defect sorting by class and high-speed root cause analysis
  7. Recipe design through Die-to-Database method

Basic Applications:

¡íSystematic or random defect verification
¡íIndirect mask inspection
¡íOPC Verification
¡íCritical Geometry Verification for Gate CD
¡íFEM, ACLV, etc
¡íDirect feedback to DFM (Design, OPC, mask qualificaiton) process
¡íCDU verification
¡íHigh quality pattern output
¡íStatistical line management through the CD measurement acquired from the wide field of view (FOV)