-NGR2100
-NGR4000
NGR4000
The NGR4000 is the world's first mask inspection tool to use a two-dimensional shape evaluation SEM. The NGR4000 uses an SEM to scan the shape of complex RET masks and directly compares the two-dimensional shape with design data using Nanogeometry's patented Die-to-Database technology to dramatically speed up the time needed to setup a device by reducing the number of protype masks necessary. Additionally, the NGR4000 is positioned to become an indespensable tool to improve the precision of lithography simulation.
¢¡1. EIAS Image ¢¡2. Power spectrum analysis

Characteristics:

  1. Newly developed Electron Image Acquiring System (EIAS)
  2. Wide field of view (FOV)
  3. Cr, MoSi and Quartz mask compatible
  4. Proprietary image processing algorithm for real time inspection
  5. Can handle design data of several hundred gigabytes
  6. Power spectrum analysis (under development) using FOV
  7. Indispensible for improving the precision of lithography simulations

Basic Applications:

¡íSEM-Image and design data comparison (GDS format output)
¡íCD measurement